Niobium Oxide (Nb2O5) Sputtering Target

Niobium Oxide (Nb2O5) sputtering target is a high-purity material used in the physical vapor deposition (PVD) process to deposit thin films in various applications such as electronics, optics, and energy. Nb2O5 sputtering targets are commonly used in the production of capacitors, fuel cells, and electrochromic devices. The sputtering target is made by compressing and sintering high-purity Nb2O5 powder into a dense, uniform, and homogeneous structure. The target's size and shape can be customized according to the specific requirements of the deposition process. During the sputtering process, ions are bombarded onto the surface of the target, causing the ejection of atoms and molecules that form a thin film on the substrate. Nb2O5 sputtering targets are known for their high purity, good thermal and electrical conductivity, and excellent adhesion to substrates, making them a popular choice for many PVD applications. Niobium Oxide Sputtering Target Properties (Theoretical) Compound F