High-power Magnetron Plasma Sputter Coater MPSC-500RS, 500mA, Rotatable SH and option for thickness control

General Introduction The MPSC-500RS is a high-power (up to 500mA sputtering current) Magnetron Plasma Sputter Coater designed for depositing various conductive metal films for device prototyping across diverse fields and for SEM sample preparation. This robust system can sputter-coat common materials like gold, platinum, indium, palladium, and silver, as well as more challenging metals such as nickel, aluminum, copper, titanium, and cobalt. It is a powerful high-performance magnetron plasma sputter capable of coating at vacuum levels of 1 Pa or lower. The original metallic color of the coating can be preserved when used in conjunction with a turbo molecular pump. Key features of the MPSC-500RS include high sputter power, a rotatable sample holder, real-time monitoring of sputtering current and voltage, a programmable sputter process, an electrically controlled shutter, and adjustable sample height. Optionally, the MPSC-500RS can be equipped with a high-precision quartz crystal thicknes