P04900 - SEMI P49 - Specification for Experimental Curvilinear Multigon Extension to SEMI P39

 NOTICE: This is a Preliminary Standard. Preliminary Standards are approved for publication by a single chapter of a technical global committee for information and comment prior to letter balloting for its adoption as a Full-consensus Standard. Preliminary Standards are published for a period of no more than two years, unless a publication extension is granted by the International Standards Committee. This Preliminary Standard will be removed from publication, and will no longer be available for purchase, during the August 2025 publication cycle. Suggestions for improvements should be submitted to the Microlithography Global Technical Committee or Standards staff. The purpose of this Specification is to define an experimental record for SEMI P39 OASIS which is capable of describing curvilinear figures using splines. This Specification was drafted by the SEMI Curvilinear Format Task Force.ScopeThis Specification intends to reduce the size of OASIS files containing inverse lithography te