Al2O3 Sapphire Crystal Substrate

Purity: > 99.99% Polished surface: substrate surface is EPI polished via a special CMP procedure with Ra < 5A, one or two side polished Sapphire substrate is the popular substrates for III-V nitrides, superconductor and magnetic epi film due to less mis-matched lattice and stable chemical and physical properties Orientation tolerance: +/-0.5°